For more information, contact:

Tom Grove Advanced Energy Industries, Inc. (970) 224-6313

Brochure Describes the only RF Power Measurement Package Designed for Plasma-Based Processes

FORT COLLINS, Colorado (May 31, 1996)—Advanced Energy Industries, Inc. (AE) announces the only RF power measurement instrumentation package designed for the plasma-based thin film process environment—the advanced GenCal system. The GenCal system provides industry-leading measurement accuracy at the discrete frequencies commonly used in the plasma process industry.

 

The GenCal system uses the same state-of-the-art hybrid power sensor technology used by AE’s R&D Award winning RFZ 60 plasma impedance probe. This optimized technology provides measurements in the presence of plasma-generated signals that have high harmonic content and noise with an accuracy not currently available in other power measurement instruments.

The GenCal system is a two-part design, consisting of:

• The control electronics package: a convenient hand-held meter
• The power measurement head: available in three models for many frequencies and power ranges

Benefits

• Minimum effect of amplitude modulation (AM)
• Not effected by harmonics
• ± 1% accuracy

For a free copy of the brochure describing the advanced GenCal™ system (AE #5600045), contact AE at the address and phone number given above.

 

Founded in 1980, AE is a leading supplier of power conversion and control systems for plasma-based thin film production equipment. Our systems are critical to industrial processes that use gaseous plasmas to deposit or etch thin film layers on materials or substrates such as glass, silicon, and metals during the manufacture of semiconductors, data storage media, flat panel displays, and a host of other products.